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Publicationer information ikon

MHD characteristics of ELMs and their precursors

Maraschek, M.; Gunter, S.; Kass, T.; Saarelma, S.; Zehrfeld, H.; Zohm, H.
-1998Publicationer information ikon

Organometallic precursors for atomic layer deposition

Referentgranskad
Putkonen, Matti; Niinistö, Lauri
-2005Publicationer information ikon

Cyclopentadienyl-type precursors for atomic layer deposition of thin films

Referentgranskad
Putkonen, Matti; Niinistö, Lauri
University of Helsinki2004Publicationer information ikon

Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

Putkonen, Matti; Nieminen, Minna; Niinistö, Lauri
-2002Publicationer information ikon

Sombre precursors

Yli-Annala, Kari
Sombre precursors2023Publicationer information ikon

ZrO2 and HfO2 Thin Films from Cyclopentadienyl Precursors by Atomic Layer Deposition

Referentgranskad
Niinistö, Jaakko; Putkonen, Matti; Niinistö, Lauri
-2003Publicationer information ikon

Synthesis of Globular Precursors

Referentgranskad
DOI
10.1002/chem.201501223
Teixidor, Francesc; Sillanpää, Reijo; Pepiol, Ariadna; Lupu, Marius; Vinas, Clara
Chemistry: A European Journal2015Publicationer information ikon

Precursors for ALD Processes

Referentgranskad
Putkonen, Matti; Knez, Mato; Pinna, N.
-2011Publicationer information ikon

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Referentgranskad
DOI
10.1016/j.tsf.2014.02.087
Putkonen, Matti; Bosund, Markus; Ylivaara, Oili M E; L.Puurunen, Riikka; Kilpi, Lauri; Ronkainen, He...
Thin solid films2014Publicationer information ikon

Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition

Referentgranskad
Öppen tillgång
DOI
10.1002/chem.202103798
Boysen, Nils; Philip, Anish; Rogalla, Detlef; Karppinen, Maarit; Devi, Anjana
CHEMISTRY: A EUROPEAN JOURNAL2022

MHD characteristics of ELMs and their precursors

1998

Organometallic precursors for atomic layer deposition

Referentgranskad
2005

Cyclopentadienyl-type precursors for atomic layer deposition of thin films

Referentgranskad
2004

Magnesium aluminate thin films by atomic layer deposition from organometallic precursors and water

2002

Sombre precursors

2023

ZrO2 and HfO2 Thin Films from Cyclopentadienyl Precursors by Atomic Layer Deposition

Referentgranskad
2003

Synthesis of Globular Precursors

Referentgranskad
DOI
10.1002/chem.201501223
2015

Precursors for ALD Processes

Referentgranskad
2011

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Referentgranskad
DOI
10.1016/j.tsf.2014.02.087
2014

Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition

Referentgranskad
Öppen tillgång
DOI
10.1002/chem.202103798
2022